Lv45
770 积分 2024-12-05 加入
Mask CD control (CDC) using AIMS as the CD metrology data source
1天前
已完结
New process models for OPC at sub-90-nm nodes
1天前
已完结
Performance comparison of techniques for intra-field CD control improvement
1天前
已完结
EUV OPC methodology for beyond 20nm memory cell by simulation data
1个月前
已完结
Stitching insights towards high numerical aperture extreme ultraviolet lithography: an experimental study
1个月前
已完结
OPC and modeling solution to support 0.55NA EUV stitching
1个月前
已完结
Robust hybrid source and mask optimization to lithography source blur and flare
1个月前
已完结
Rapid full-chip curvilinear OPC for advanced logic and memory
2个月前
已完结
Efficient measurement and optical proximity correction modeling to catch lithography pattern shift issues of arbitrarily distributed hole layer
2个月前
已完结
Hierarchical optical proximity correction on contact hole layers
2个月前
已完结
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