Lv11
40 积分 2025-10-10 加入
Etch profiles in silicon in SF 6 and O 2 plasma based on etch-depth-dependent O/F transport gradient model
3小时前
求助中
Single-step deep reactive ion etch of silicon for through-via applications with alternative gas mixtures
20天前
已完结
Deep-reactive ion etching of silicon nanowire arrays at cryogenic temperatures
20天前
已完结
Chemistry in Cryogenic Etching: A Tutorial
20天前
已完结
Optimization of silicon etch rate in a CF4/Ar/O2 inductively coupled plasma
29天前
已完结
Reactive Ion Etching of Silicon and Silicon Dioxide in CF 4 Plasmas Containing H 2 or C 2 F 4 Additives
1个月前
已完结
Etching of smoothing/without undercutting deep trench in silicon with SF 6 /O 2 containing plasmas
1个月前
已关闭
Fluorocarbon (C4F8) assisted plasma-enhanced atomic layer etching (PEALE) of SiO2 with high repeatability of cycles in industrial ICP reactor. I. experiment
1个月前
已关闭
Role of SiCl4 addition in CH3F/O2 based chemistry for Si3N4 etching selectively to SiO2, SiCO, and Si
1个月前
已完结
Deep silicon etching technology and applications: a review
1个月前
已完结
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