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20 积分 2023-10-29 加入
Positive electron beam resists for lithography below 5 nm
4天前
求助中
Cyclic–acyclic monomers metathesis polymerization for the synthesis of degradable thermosets, thermoplastics and elastomers
7天前
已完结
Group transfer radical polymerization: Translating organic synthesis to functional polymers
13天前
已完结
Sensitizers in extreme ultraviolet chemically amplified resists: mechanism of sensitivity improvement
2个月前
已完结
Sensitizers in extreme ultraviolet chemically amplified resists: mechanism of sensitivity improvement
3个月前
已完结
EUV resist sensitization and roughness improvement by PSCAR with in-line flood exposure system (Conference Presentation)
5个月前
已完结
PSCAR optimization to reduce EUV resist roughness with sensitization using Resist Formulation Optimizer (RFO) (Conference Presentation)
5个月前
已完结
EUV resist performance enhancement by UV flood exposure for high NA EUV lithography
5个月前
已完结
EUV resist chemical gradient enhancement by UV flood exposure for improvement in EUV resist resolution, process control, roughness, sensitivity and stochastic defectivity
5个月前
已完结
Structurally Well‐Resolved Conformational Isomers in Expanded Porphyrinoids: Structures and Photophysical Properties
8个月前
已关闭
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