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94 积分 2024-03-11 加入
Evaluation of vapor pressure of MoO2Cl2 and its initial chemical reaction on a SiO2 surface by ab initio thermodynamics
16天前
已完结
Molybdenum Thin Film Formation from Molybdenum Nitride Deposited by Plasma-enhanced Atomic Layer Deposition with Hydrogen-permeable Mechanical Capping Layer
16天前
已完结
Molybdenum(III) Amidinate: Synthesis, Characterization, and Vapor Phase Growth of Mo-Based Materials
17天前
已完结
Study on the Erosion Resistance of Different TiN Crystal Planes by Molecular Dynamics
2个月前
已完结
A comparison of tungsten film deposition techniques for very large scale integration technology
1年前
已完结
Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
1年前
已完结
Phase, grain structure, stress, and resistivity of sputter-deposited tungsten films
1年前
已完结
Application of Atomic Layer Deposition Tungsten (ALD W) as Gate Filling Metal for 22 nm and Beyond Nodes CMOS Technology
1年前
已完结
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