Lv41
660 积分 2026-04-29 加入
Plasma etching of high aspect ratio features in SiO2 using Ar/C4F8/O2 mixtures: A computational investigation
7天前
已完结
Reaction mechanism for HF based cryogenic plasma etching of SiO2
7天前
已完结
Molecular dynamics simulation of mechanical properties for silicon nitride deposited by PECVD method
12天前
已完结
ALE Method for Simulations of Laser-Produced Plasmas
1个月前
已完结
Future of plasma etching for microelectronics: Challenges and opportunities
2个月前
已完结
Dust-cloud spatial distribution and striated discharge structure in complex plasmas driven by dual-frequency discharges
2个月前
已完结
Autonomous hybrid optimization of a SiO2 plasma etching mechanism
3个月前
已完结
Comparison of glancing-angle scatterings on different materials in a high aspect ratio plasma etching process using molecular dynamics simulation
3个月前
已完结