Lv5
1380 积分 2024-02-19 加入
Atomic layer etching of titanium nitride with surface modification by Cl radicals and rapid thermal annealing
1个月前
已完结
Outside Front Cover: Low Temperature Atomic Layer Deposition of (00l)‐Oriented Elemental Bismuth
1个月前
已完结
Deposition selectivity on oxide versus metal surfaces via catalyzed atomic layer deposition of SiO2 and vapor-dosed phosphonic acid inhibitors
1个月前
已关闭
Adsorption mechanism of hexachlorodisilane for low-temperature atomic layer deposition of silicon nitride
1个月前
已完结
Assay, Purity, and Impurity Profile of Phosphorothioate Oligonucleotide Therapeutics by Ion Pair–HPLC–MS
2个月前
已完结
Properties of ultrathin molybdenum films for interconnect applications
2个月前
已完结
Electrical behavior of ALD-molybdenum films in the thin-film limit
2个月前
已完结
Deposition techniques for thin film development in microelectronic devices
2个月前
已完结
Atomic layer etching of high-k oxide thin films using hexafluoroacetylacetone and oxygen radicals
2个月前
已完结
Atomic Layer Etching of SiO2 Utilizing Ultra-Low Electron Temperature Plasma
2个月前
已完结
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