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1210 积分 2024-02-19 加入
Deposition techniques for thin film development in microelectronic devices
5天前
已完结
Probing the Effects of Dimethyl Aluminum Isopropoxide Surface Reaction Byproducts on Atomic Layer Deposition Nucleation
5天前
已完结
The Vapor Pressure of Liquid Fluorine
5天前
已完结
Characteristics of carbon-containing low-k dielectric SiCN thin films deposited via remote plasma atomic layer deposition
1个月前
已完结
Inhibitor-Free Area-Selective Deposition of Titanium Nitride
2个月前
已完结
Study on thickness uniformity of Ta2O5 film evaporated on the inner-face of a hemispherical substrate
7个月前
已完结
Ellipsometry study on silicon nitride film with uneven thickness distribution by plasma-enhanced chemical vapor deposition
7个月前
已完结
Atomic layer epitaxy of twinned TiN by hydrogen-manipulated tailoring on monolayer
8个月前
已完结
Atomic layer epitaxy of twinned TiN by hydrogen-manipulated tailoring on monolayer
9个月前
已完结
Amorphous Si–B–C–N coatings for high-temperature oxidation protection of the γ-TiAl alloy
10个月前
已完结
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