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Dry etching characteristics of TiN film using Ar/CHF3, Ar/Cl2, and Ar/BCl3 gas chemistries in an inductively coupled plasma
11小时前
待确认
Impact of the radiation effect on the energy storage density and wake-up behaviors of antiferroelectric-like Al-doped HfO2 thin films
1个月前
已完结
Ferroelectricity in yttrium-doped hafnium oxide
1个月前
已完结
La-doped Hf0.5Zr0.5O2 thin films for high-efficiency electrostatic supercapacitors
1个月前
已完结
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