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Stress control in thick hydrogenated amorphous carbon films to mitigate stress-induced defects in semiconductor processes
36分钟前
已完结
Nitrogen Doped High Selectivity Amorphous Carbon Film for High Aspect Ratio Etch Process
4个月前
已完结
Stress control in thick hydrogenated amorphous carbon films to mitigate stress-induced defects in semiconductor processes
4个月前
已完结
Recent Advances in Porous Low-k Materials for Integrated Circuits
7个月前
已完结
Novel Advanced Low-k Dielectric for 2 nm and Beyond Cu and Post Cu Dual Damascene BEOL Interconnect Technologies
7个月前
已完结
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