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Revealing the controlling mechanisms of atomic layer etching for high-k dielectrics in conventional inductively coupled plasma etching tool
5个月前
已完结
Research on the Wake-up Effect of Ferroelectric HfO2-ZrO2 Thin Films
5个月前
已完结
Revealing the controlling mechanisms of atomic layer etching for high-k dielectrics in conventional inductively coupled plasma etching tool
5个月前
已完结
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