Lv11
60 积分 2024-12-20 加入
Structure-Dependent Ferroelectric Enhancement in Hf0.5Zr0.5O2 Thin Films under High-Pressure Post-Deposition Annealing
2小时前
求助中
Excellent Ferroelectricity in 6 nm HZO with Sub-5 nm Nb Electrodes and Nb 2 O 5 Interface Engineering at Low Thermal Budget of 300 °C
1个月前
已完结
Temperature‐Graded Deposition of HfZrO x for Ferroelectric Capacitors With Enhanced Polarization, Reliability, and Switching
1个月前
已关闭
In Situ Study of the Ferroelectric–Antiferroelectric Phase Transition in Hf 1– x Zr x O 2 at Elevated Temperatures up to 600 °C
2个月前
已完结
Ultrathin Hf 0.5 Zr 0.5 O 2 Films with ZrO 2 Seed Layer for Ferroelectric Tunnel Junctions in Crossbar Array
3个月前
已完结
Field-Induced Enhancement of Ferroelectric Switching in Hf0.5Zr0.5O2 Capacitors under Cryogenic Conditions
4个月前
已完结
All-Oxide ITO/HZO/WO x Ferroelectric Tunnel Junctions with Oxygen-Engineered Interfaces for Highly Endurable Neuromorphic Computing
4个月前
已完结
A Critical Strain Window for Stabilizing Polar Orthorhombic Hf 0 . 5 Zr 0 . 5 O 2 Epitaxial Thin Films with Scale‐Free Domain Walls
4个月前
已完结
Ultrathin ZrO 2 Seed Layers for Low-Temperature Orthorhombic Ferroelectric Hf 1– x Zr x O 2
4个月前
已完结
PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
4个月前
已完结
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