Lv11
60 积分 2024-09-06 加入
An ionic liquid-based photoresist with expandable applications: direct patterning from small molecules via thiol-ene photopolymerization
11小时前
待确认
High-sensitivity extreme ultraviolet photoresists based on heteroleptic Sn complexes
1个月前
已完结
Antimony‐Oxo‐Cluster‐Based Polymers as Positive‐Tone EBL/EUV Photoresists: Lithography Performance Enhancement by Network Structure Modulation
8个月前
已完结
Synthesis of Ph3Sb(O2CR)2 Compounds with Unsaturated Carboxylic Acids and Use of Triphenylantimony Dicrotonate for the Production of Sb-Containing Polymers
10个月前
已完结
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