Lv1
60 积分 2024-09-06 加入
An ionic liquid-based photoresist with expandable applications: direct patterning from small molecules via thiol-ene photopolymerization
2个月前
已完结
High-sensitivity extreme ultraviolet photoresists based on heteroleptic Sn complexes
3个月前
已完结
Antimony‐Oxo‐Cluster‐Based Polymers as Positive‐Tone EBL/EUV Photoresists: Lithography Performance Enhancement by Network Structure Modulation
11个月前
已完结
Synthesis of Ph3Sb(O2CR)2 Compounds with Unsaturated Carboxylic Acids and Use of Triphenylantimony Dicrotonate for the Production of Sb-Containing Polymers
1年前
已完结
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