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100 积分 2025-07-07 加入
A comparative study of dry-etching nanophotonic devices on a LiNbO3-on-insulator material platform
20天前
已完结
Dry etching of LiNbO3 using inductively coupled plasma
24天前
已完结
Nanometer-sized etching of lithium niobate domain wall devices
24天前
已完结
Argon plasma inductively coupled plasma reactive ion etching study for smooth sidewall thin film lithium niobate waveguide application
27天前
已完结
Deep anisotropic LiNbO3 etching with SF6/Ar inductively coupled plasmas
1个月前
已完结
Comparative Study of Ar- and He-rich SF6 + Ar + He Plasmas for Dry Etching Applications: Diagnostics and Kinetic Modeling
1个月前
已完结
Modeling the plasma chemistry of C2F6 and CHF3 etching of silicon dioxide, with comparisons to etch rate and diagnostic data
1个月前
已完结
Plasma Parameters and Kinetics of Active Particles in the Mixture CHF3 + O2 + Ar
1个月前
已完结
Parameters of Plasma and Kinetics of Active Particles in CF4 (CHF3) + Ar Mixtures of a Variable Initial Composition
1个月前
已完结
Plasma Parameters and Kinetics of Active Particles in the Mixture CHF3 + O2 + Ar
1个月前
已完结
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