Lv3
270 积分 2025-07-07 加入
A Comparison of CF4, CHF3 and C4F8 + Ar/O2 Inductively Coupled Plasmas for Dry Etching Applications
1个月前
已完结
Integrated resonance-enhanced variable optical delay lines
4个月前
已完结
A comparative study of dry-etching nanophotonic devices on a LiNbO3-on-insulator material platform
6个月前
已完结
Dry etching of LiNbO3 using inductively coupled plasma
6个月前
已完结
Nanometer-sized etching of lithium niobate domain wall devices
6个月前
已完结
Argon plasma inductively coupled plasma reactive ion etching study for smooth sidewall thin film lithium niobate waveguide application
6个月前
已完结
Deep anisotropic LiNbO3 etching with SF6/Ar inductively coupled plasmas
6个月前
已完结
Comparative Study of Ar- and He-rich SF6 + Ar + He Plasmas for Dry Etching Applications: Diagnostics and Kinetic Modeling
6个月前
已完结
Modeling the plasma chemistry of C2F6 and CHF3 etching of silicon dioxide, with comparisons to etch rate and diagnostic data
6个月前
已完结
Plasma Parameters and Kinetics of Active Particles in the Mixture CHF3 + O2 + Ar
6个月前
已完结
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