Lv25
180 积分 2023-12-08 加入
Electrochemical Polishing of Two-Dimensional Materials
1天前
待确认
Demonstration of Conformal MoS2 on High-Aspect-Ratio Structures up to 40:1 and Exploration of Manufacturability in a 300mm Fab for 3D NAND applications
1天前
已完结
The Role of Polycrystalline MoS2 as Diffusion Barrier in Ru Interconnects: Thermal Stability and Electrical Performances
10天前
已完结
The Nature of the Interatomic Forces in Metals
17天前
已完结
The Effects of Hardness Variation on a CMP Model of Copper thin Films
17天前
已完结
High-Quality Surface Preparation of Inconel 718 Nickel-Based Superalloy Considering Chemical Mechanical Polishing
28天前
已完结
Advances in regulating the electron spin effect toward electrocatalysis applications
28天前
已完结
The influence of pH and H2O2 on surface quality and material removal rate during W-CMP
28天前
已完结
Post Tungsten CMP Cleaning: Optimization for Cleaning Efficiency and Corrosion Reduction
28天前
已完结
Study on the removal rate and electrochemical corrosion of titanium in chemical mechanical polishing
29天前
已完结
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