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12 积分 2026-07-15 加入
Selective molecular gas phase etching in layered high aspect-ratio nanostructures for semiconductor processing. II. Experiments and model validation
2天前
已完结
Kinetics model for thermal selective etching of Si1−xGex in F2/Ar
16天前
已完结
Effect of gas additives on reaction barriers in cryo etching of silicon oxide and nitride
19天前
已完结
First-Principles Dissociation Pathways of BCl3 on the Si(100)‑2 × 1 Surface
1个月前
已完结
First-Principles Dissociation Pathways of BCl3 on the Si(100)‑2 × 1 Surface
1个月前
已完结
Deposition products predicted from conceptual DFT: The hydrolysis reactions of MoF6, WF6, and UF6
1个月前
已完结
Modeling of microtrenching and bowing effects in nanoscale Si inductively coupled plasma etching process
1个月前
已完结
Multiscale modeling of plasma–surface interaction—General picture and a case study of Si and SiO₂ etching by fluorocarbon-based plasmas
1个月前
已完结
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