Lv41
436 积分 2026-07-15 加入
Progress Report on High Aspect Ratio Patterning for Memory Devices
1小时前
已完结
Cryogenic plasma etching for SiO2/SiN dielectric films: a mini review
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已完结
Development for high-aspect-ratio hole etching with hydrogen fluoride gas based cryogenic process
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已完结
Etching mechanism of amorphous hydrogenated silicon nitride by hydrogen fluoride
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已完结
unraveling etching mechanism for SiN film in cryogenic hydrogen-fluoride plasmas
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已完结
Low-temperature etching of silicon oxide and silicon nitride with hydrogen fluoride
1小时前
已完结
Modeling diffusion and depletion in high-aspect-ratio atomic layer deposition processes: Process parameters and manufacturing impacts
1个月前
已完结
Integrated feature-scale simulation framework for atomic layer deposition incorporating transient transport and kinetics
1个月前
已完结
Stochastic lattice model for atomic layer deposition and area-selective deposition of metal oxides: Visualization and analysis of lateral overgrowth during area-selective deposition
1个月前
已完结
A novel kinetic framework-based multiscale modeling of spatial atomic layer deposition process
1个月前
已完结
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