| 标题 |
Plasma-polymer interactions: A review of progress in understanding polymer resist mask durability during plasma etching for nanoscale fabrication |
| 网址 | |
| DOI | |
| 其它 |
期刊:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena 作者:Gottlieb S. Oehrlein; Raymond J. Phaneuf; David B. Graves 出版日期:2011-01-01 |
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(2025-6-4)