| 标题 |
Adjustable sidewall slopes by electron-beam exposure layout |
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| DOI | |
| 其它 |
期刊:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena 作者:Corinna Kaspar; Jörg Butschke; Mathias Irmscher; Stephan Martens; Holger Sailer; et al 出版日期:2017-08-18 |
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(2025-6-4)