| 标题 |
The effect of amino acid addition in CeO2-based slurry on SiO2/Si3N4 CMP: Removal rate selectivity, morphology, and mechanism research |
| 网址 | |
| DOI | |
| 其它 |
期刊:Journal of Molecular Liquids 作者:Xinyu Han; Shihao Zhang; Renhao Liu; Fangyuan Wang; Baimei Tan; et al 出版日期:2024-08-25 |
| 求助人 | |
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(2025-6-4)