| 标题 |
Alternative mask materials for low-k1 EUV imaging |
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| DOI | |
| 其它 |
期刊:35th European Mask and Lithography Conference (EMLC 2019) 作者:Frank J. Timmermans; Claire van Lare; Jo Finders; Uwe F. Behringer; Jo Finders 出版日期:2019 |
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(2025-6-4)