| 标题 |
Anisotropic Etching of InP and InGaAs by Using an Inductively Coupled Plasma in Cl2/N2 and Cl2/Ar Mixtures at Low Bias Power |
| 网址 | |
| DOI |
10.3938/jkps.50.1130
doi
|
| 其它 |
期刊:Journal of the Korean Physical Society 作者:J. W. Bae; Chang-Gyun Jeong; Jong Tae Lim; Hwon‐gi Lee; G.Y. Yeom; et al 出版日期:2007-04-14 |
| 求助人 | |
| 下载 | 暂无链接,等待应助者上传 |
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(2025-6-4)