| 标题 |
Scanning-helium-ion-beam lithography with hydrogen silsesquioxane resist |
| 网址 | |
| DOI | |
| 其它 |
期刊:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena 作者:D. Winston; B. M. Cord; B. Ming; D. C. Bell; W. F. DiNatale; et al 出版日期:2009 |
| 求助人 | |
| 下载 |
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(2025-6-4)