| 标题 |
Effects of radio frequency bias frequency and radio frequency bias pulsing on SiO2 feature etching in inductively coupled fluorocarbon plasmas |
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| DOI | |
| 其它 |
期刊:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena 作者:M. Schaepkens; G. S. Oehrlein; J. M. Cook 出版日期:2000-03-01 |
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(2025-6-4)