| 标题 |
Phosphorus redistribution in P-doped polycrystalline silicon/tantalum silicide system during high temperature sintering |
| 网址 | |
| DOI | |
| 其它 |
期刊:Journal of Applied Physics 作者:S. Luryi; N. Lifshitz 出版日期:2003-02-15 |
| 求助人 | |
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(2025-6-4)