| 标题 |
Cryogenic HF plasma etching of SiO2: Etchant penetration, reactions, and damage formation |
| 网址 | |
| DOI | |
| 其它 |
期刊:Applied Surface Science 作者:Shota Nunomura; Yusuke Imai; Shih-Nan Hsiao; Takayoshi Tsutsumi; Masaru Hori 出版日期:2027-01-01 |
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(2025-6-4)