| 标题 |
The Dry Etching of TiN Thin Films Using Inductively Coupled CF4/Ar Plasma |
| 网址 | |
| DOI |
10.4313/teem.2013.14.2.67
doi
|
| 其它 |
期刊:Transactions on Electrical and Electronic Materials 作者:Jong-Chang Woo; Chang-Auck Choi; Young-Hee Joo; Han-Soo Kim; Chang-Il Kim 出版日期:2013-04-25 |
| 求助人 | |
| 下载 | 暂无链接,等待应助者上传 |
PDF的下载单位、IP信息已删除
(2025-6-4)