| 标题 |
Mechanistic study of CeO2 cocatalysis and ZnFe2O4 photocatalysis synergistically enhancing a Fenton-based slurry for chemical mechanical polishing of SiC wafer |
| 网址 | |
| DOI | |
| 其它 |
期刊:Wear 作者:Wang-Yang Li; Gong Lv; Chen-Yu Wang; Ye You; Ying-Min Wang; et al 出版日期:2026-11-01 |
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(2025-6-4)