| 标题 |
Gradient-based source mask and polarization optimization with the hybrid Hopkins–Abbe model |
| 网址 | |
| DOI | |
| 其它 |
期刊:Journal of Micro/Nanolithography, MEMS, and MOEMS 作者:Ming Ding; Zhiyuan Niu; Fang Zhang; Linglin Zhu; Weijie Shi; et al 出版日期:2020-09-09 |
| 求助人 | |
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(2025-6-4)