标题 |
Optical, structural and composition properties of silicon nitride films deposited by reactive radio-frequency sputtering, low pressure and plasma-enhanced chemical vapor deposition
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网址 | |
DOI |
10.1016/j.tsf.2022.139568
doi
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其它 |
期刊:Thin Solid Films 作者:Leonid Yu. Beliaev; Evgeniy Shkondin; Andrei Lavrinenko; Osamu Takayama 出版日期:2022-12-01 |
求助人 | |
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