| 标题 |
Reliable EUV lithography via on-wafer conversion of multinuclear tin photoresists with improved time-dependent hydrolytic stability |
| 网址 | |
| DOI | |
| 其它 |
期刊:Journal of Materials Chemistry C 作者:Yeo Kyung Kang; Yu Jin Jo; Chul Gyu Lee; Yu Seok Ham; Hoyoung Kim; et al 出版日期:2026-01-01 |
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(2025-6-4)