| 标题 |
Advancing DRAM patterning: high-NA EUV lithography for 10nm and beyond node technologies |
| 网址 | |
| DOI | |
| 其它 |
期刊:Optical and EUV Nanolithography XXXIX 作者:Yeeun Han; Yeongchan Cho; Kangjae Lee; Sudeok Kim; Hyungju Ryu; et al 出版日期:2026-04-10 |
| 求助人 | |
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(2025-6-4)