2 keV Ga+ FIB Milling for Reducing Amorphous Damage in Silicon

Extract HTML view is not available for this content. However, as you have access to this content, a full PDF is available via the 'Save PDF' action button. Extended abstract of a paper presented at Microscopy and Microanalysis 2005 in Honolulu, Hawaii, USA, July 31--August 4, 2005