抵抗
光刻胶
跟踪(心理语言学)
透视图(图形)
计算机科学
纳米技术
材料科学
人工智能
语言学
哲学
图层(电子)
作者
C. Grant Willson,Ralph R. Dammel,Arnost Reiser
摘要
This paper provides a short history of the development of resist materials. We trace the development of resists from the very beginnings of photography in the early 1800s to today's efforts to develop 193 nm resist materials.
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