神经形态工程学
电阻随机存取存储器
材料科学
电阻式触摸屏
记忆电阻器
光电子学
电子工程
计算机科学
电气工程
工程类
电压
人工神经网络
人工智能
作者
Seyoung Kim,Jonghwan Lee
出处
期刊:Nanomaterials
[MDPI AG]
日期:2024-11-21
卷期号:14 (23): 1864-1864
被引量:1
摘要
This paper presents a method for modeling ReRAM in TCAD and validating its accuracy for neuromorphic systems. The data obtained from TCAD are used to analyze the accuracy of the neuromorphic system. The switching behaviors of ReRAM are implemented using the kinetic Monte Carlo (KMC) approach. Realistic ReRAM characteristics are obtained through the use of the trap-assisted tunneling (TAT) model and thermal equations. HfO2-Al2O3-based ReRAM offers improved switching behaviors compared to HfO2-based ReRAM. The variation in conductance depends on the structure of the ReRAM. The conductance extracted from TCAD is validated in the neuromorphic system using the MNIST (Modified National Institute of Standards and Technology) dataset.
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