光掩模
半导体工业
技术路线图
平版印刷术
新兴技术
制造工程
半导体器件制造
产品(数学)
计算机科学
质量(理念)
工程类
电气工程
纳米技术
抵抗
业务
材料科学
数学
图层(电子)
光电子学
人工智能
营销
认识论
几何学
哲学
薄脆饼
摘要
The semiconductor industry is constantly evolving, and advanced OPC and mask technologies are at the forefront of this evolution. In this keynote address, we will explore the power of these technologies and their role in shaping the future of the industry. Photomask technology and quality significantly influence how well semiconductor chip design objectives are realized in the final product. From enabling higher resolution lithography to improving yield and reducing costs, advanced OPC and mask technology have the potential to revolutionize the semiconductor industry. Through practical examples, we will demonstrate the impact of these technologies and provide insights into the future of semiconductor manufacturing. Join us as we explore how advanced OPC and mask technology are shaping the future of the industry.
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