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Double photoelectron-transfer mechanism in Ag−AgCl/WO3/g-C3N4 photocatalyst with enhanced visible-light photocatalytic activity for trimethoprim degradation

光催化 X射线光电子能谱 降级(电信) 光化学 材料科学 化学 电子顺磁共振 纳米复合材料 电子转移 傅里叶变换红外光谱 核化学 化学工程 纳米技术 催化作用 有机化学 电信 工程类 核磁共振 计算机科学 物理
作者
Gongduan Fan,Rongsheng Ning,Zhongsen Yan,Jing Luo,Banghao Du,Jiajun Zhan,Lingshan Liu,Jin Zhang
出处
期刊:Journal of Hazardous Materials [Elsevier BV]
卷期号:403: 123964-123964 被引量:160
标识
DOI:10.1016/j.jhazmat.2020.123964
摘要

Antibiotic contamination is increasing scrutinized recently. In this work, the Ag−AgCl/WO 3 /g-C 3 N 4 (AWC) nanocomposites were successfully synthesized using a two-step process involving electrostatic self-assembly and in-situ deposition for trimethoprim (TMP) degradation. The as-prepared photocatalysts were investigated and characterized by XRD, FTIR, XPS, TGA, SEM, TEM, UV–vis, PL and EIS. The experimental results indicated that 99.9% of TMP (4 mg/L) was degraded within 60 min when the concentration of AWC was 0.5 g/L. Reactive species scavenging experiments and electron spin resonance (ESR) experiments illustrated that superoxide radical (•O 2 − ) and photogenerated holes (h + ) were the main active species. The functional theory calculation and identification of intermediates via HPLC-MS revealed the possible degradation pathways of TMP. A double photoelectron-transfer mechanism in AWC photocatalyst was proposed. Five cycling photocatalytic tests and reactions under different solution matrix effects further supported that the AWC was a promising photocatalyst for the removal of TMP from the aquatic environment. • Novel photocatalyst of Ag−AgCl and WO 3 co-loaded with g-C 3 N 4 was synthesized. • The AWC composites showed enhanced photocatalytic activity on TMP degradation. • A double photoelectron-transfer mechanism in AWC photocatalyst was proposed. • The possible degradation pathways of TMP were proposed.
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