光解
化学
光化学
碘甲烷
X射线光电子能谱
化学吸附
单层
解吸
猝灭(荧光)
吸附
基质(水族馆)
卤化物
碘化物
键裂
异构化
辐照
烷基
热脱附光谱法
无机化学
物理化学
催化作用
荧光
有机化学
生物化学
物理
海洋学
核磁共振
量子力学
核物理学
地质学
标识
DOI:10.1016/0039-6028(91)90087-9
摘要
The surface photochemistry of methyl iodide (CH3I) on Ag(111) has been studied using X-ray photoelectron spectroscopy (XPS) and temperature programmed desorption (TPD). While adsorbed CH3I does not dissociate thermally at 100 K., it is easily photodissociated. Upon the CI bond cleavage, all I and a small portion of ch3 are retained at the surface; most CH3 desorbs during UV irradiation. There is no photodesorption of molecular CH3I. The photodissociation threshold is ∼ 2.6 eV for chemisorbed monolayer CH3I and ∼ 3.5 eV for physisorbed multilayer CH3I. Substrate quenching of the photodissociation is observed for the chemisorbed ch3i. Comparisons with the photochemistry of C2H5Cl and CH3Br on Ag(111) are made.
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