材料科学
压电
灵敏度(控制系统)
压电加速度计
溅射
微电子机械系统
氮化铝
光电子学
加速度计
铝
电子工程
氮化物
薄膜
压电传感器
纳米技术
计算机科学
复合材料
工程类
图层(电子)
操作系统
作者
Zehui Chen,Cheng-Ying Li,Sheng‐Yuan Chu,Cheng‐Che Tsai,Yi-Hsun Wang,Hsueh‐Yu Kao,Chia‐Ling Wei,Yen-Hsiang Huang,Po-Yu Hsiao,Yun‐Hui Liu
标识
DOI:10.1109/ted.2020.3019230
摘要
In this study, we successfully deposited c-axis-oriented aluminum nitride piezoelectric films via low-temperature dc sputtering method. Based on the X-ray diffraction (XRD) and TEM analyses, deposited films with a c-axis monocrystal were identified. The effective d 33,f value of the aluminum nitride (AlN) films is 5.92 pC/N, which is better than most of the reported data using dc sputtering processing. Using ANSYS software, we simulated and designed MEMS accelerometers based on AlN films. Furthermore, we successfully fabricated MEMS accelerometers. The sensitivity of the MEMS accelerometer is 1.49 mV/g, and the resonance frequency is 7.2 kHz. The MEMS accelerometer was combined with a sensing circuit constituting a module. The sensitivity of the module increases approximately tenfold. Finally, the vibration of spindles was successfully detected using the designed module.
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