Mutants resistant to bacter iophage T5 were produced both in continuous and in stationary cultures of Escherichia coli by near-visible light, 320 to 400 millimicrons, at rates greatly exceeding spontaneous rates in the ab sence of light. Aerobic mutation rates were about twice anaerobic rates, which shows that mutations were induced in either of at least two different proces ses. Mutations induced by near-visible light involve different photochemical processes than those induced by ul traviolet light.