材料科学
高功率脉冲磁控溅射
溅射沉积
溅射
腔磁控管
工程物理
冶金
纳米技术
物理气相沉积
薄膜
光电子学
工艺工程
工程类
标识
DOI:10.1016/s0257-8972(97)00633-6
摘要
The paper gives a short survey of milestones in the development of sputtering sytems and sputtering process. It is shown that all major advances in sputtering technology are stimulated by the industry and its urgent need to produce new advanced thin films and coatings with prescribed physical and functional properties. Special attention is devoted to present trends of next development in this field.
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