Atomic layer deposition of Y2O3 films using a novel liquid homoleptic yttrium precursor tris(sec-butylcyclopentadienyl)yttrium [Y(sBuCp)3] and water

Atomic layer deposition of Y 2 O 3 films was demonstrated using a novel liquid homoleptic yttrium precursor Y( s BuCp) 3 and water. The deposited Y 2 O 3 films exhibit high purity, high crystallinity, a smooth surface, and high electronic performance.