吸收剂量
电离辐射
辐照
绝缘体上的硅
光电子学
材料科学
瞬态(计算机编程)
辐射
电压
电气工程
物理
硅
光学
计算机科学
工程类
核物理学
操作系统
作者
Baojun Liu,Ping Zhou,Liang Qian
出处
期刊:Vibroengineering procedia
[JVE International Ltd.]
日期:2023-10-20
卷期号:51: 76-81
标识
DOI:10.21595/vp.2023.23602
摘要
Total ionizing dose (TID) irradiation impacts the device leakage currents or threshold voltage, which affects the single event transient (SET) vulnerability of electronics under radiation environment. SET response of SOI FinFET at 14 nm technology node after TID exposure is carried out at different dose level. Results show that the drain current peak presents a slight fluctuant with total dose, while the collected charge and the bipolar amplification coefficient first decrease with total dose and then increase. The potential reason is also discussed from competing mechanisms associated with decreasing threshold voltage from TID irradiation and increasing the drain diffuse current from the potential of the channel.
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