CMOS芯片
质子
平面的
辐照
材料科学
光电子学
香料
辐射硬化
电气工程
电子工程
物理
核物理学
计算机科学
工程类
计算机图形学(图像)
作者
Alexandra-Gabriela Şerban,Andrea Coronetti,Rubén García Alía,Francesc Salvat–Pujol
标识
DOI:10.1109/tns.2024.3520506
摘要
The ubiquitous use of electronic devices in high-radiation environments requires robust methods for assessing and improving their resilience against single-event effects (SEEs) and, especially, single-event upsets (SEUs). In this study, SEU production induced by protons below 500 MeV in three commercial bulk planar static random access memories (SRAMs) manufactured on different standard CMOS technology nodes (from 250 to 40 nm) is investigated employing the Monte Carlo (MC) particle-transport code FLUKA. A rectangular parallelepiped (RPP) model is adopted to describe the device geometry, relying on the sensitive volume (SV) and the critical charge as effective parameters. Optimal values of these two parameters that maximize the agreement between simulated and experimental SEU production cross sections are found for the three considered devices. Parameter trends in the RPP model across technology nodes are identified, thus providing practical guidelines when modeling components manufactured on other technology nodes.
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