Enhancement in Mechanical Properties of Al<sub>2</sub>O<sub>3</sub> Thin Films Deposited by Electron Beam Evaporation

Aluminum Oxide thin films are potential candidate for anti-reflection, anti-soiling, and self-cleaning applications for solar cell panels, solar water heating panels, exterior windows of buildings, glasses, car windows, fabrics, and clothes. This paper reports on effect of chopping during deposition on the intrinsic stress and adhesion of Al 2 O 3 thin films deposited by electron beam evaporation. The kinetics of the growth and structure of the thin films is governed by adhesion. The durability and its wear are related to the certain extent adhesion of the thin film to the substrate. Effect of ambient aging on the adhesion and the internal stress in the films are also reported. The effect of chopping the thin film growth, phase change and presence of Al 2 O 3 studied using scanning electron microscopy (SEM) and x-ray diffraction (XRD). The accumulation of strain energy in the thin film appears as internal stress and the binding of the vapor atoms to the substrates is referred to as adhesion. In this work, adhesion of thin films measured by direct pull off method and the internal stress is measured by interferometric method.