材料科学
锡
光热治疗
辐射测量
氮化钛
热的
光学
硅
发射率
光电子学
复合材料
氮化物
纳米技术
图层(电子)
冶金
物理
热力学
作者
Clément Chassain,Andrzej Kusiak,Kevin M. Krause,M. Garcia,Jean‐Luc Battaglia
标识
DOI:10.1002/pssr.202200328
摘要
Pulsed periodic photothermal radiometry (PPTR) allows the investigation of multilayered samples with layer thicknesses of a few hundred nanometers over a duration of a few nanoseconds. The link between theoretical calculations and experimentation is made using a Bayesian approach based on the Metropolis–Hastings algorithm. The accuracy of the PPTR method requires precise calibration to provide an accurate proper emission measurement. Furthermore, the normalization time needs to be optimized through sensitivity analysis. Without this sensitivity analysis, it is impossible to simultaneously estimate the interfacial thermal resistances in a multilayered sample. The method is tested on multilayered samples composed of platinum (Pt), titanium nitride (TiN), silicon nitride (SiN), and silicon (Si). The parameters identified are interfacial thermal resistances between Pt–TiN and TiN–SiN.
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