旋光法
材料科学
双折射
光学
平版印刷术
缓速器
电子束光刻
聚酰亚胺
反应离子刻蚀
光电子学
蚀刻(微加工)
相(物质)
抵抗
纳米技术
物理
图层(电子)
量子力学
复合材料
散射
作者
Hisao Kikuta,K. Numata,H. Arimitsu,Koichi Iwata,N. Kato
标识
DOI:10.1109/sice.2002.1195810
摘要
We developed a 92/spl times/70 micro retarder array for an imaging polarimetry. The micro retarder array consists of polyimide subwavelength-period gratings of 300 nm period with different orientations. The phase retardance is caused by the form birefringence of the subwavelength structure. The gratings were fabricated with the direct-writing electron-beam lithography and the reactive ion etching. The phase retardance was 0.57 /spl pi/ for the 550 nm light wavelength. We have observed a birefringence image of a tensed plastic film by using the imaging polarimetry system.
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