材料科学
导电原子力显微镜
带材弯曲
导电体
基质(水族馆)
光电子学
扫描隧道显微镜
晶体管
纳米
量子隧道
光学
纳米技术
原子力显微镜
物理
海洋学
地质学
复合材料
电压
量子力学
作者
Ranran Li,Takashi Taniguchi,Kenji Watanabe,Jiamin Xue
摘要
Band profiles of electronic devices are of fundamental importance in determining their properties. A technique that can map the band profile of both the interior and edges of a device at the nanometer scale is highly demanded. Conventional scanning tunneling spectroscopy (STS) can map band structure at the atomic scale but is limited to the interior of large and conductive samples. Here, we develop contact-mode STS based on a conductive atomic force microscope that can remove these constraints. With this technique, we map the band profile of MoS2 transistors with nanometer resolution at room temperature. A band bending of 0.6 eV within 18 nm of the edges of MoS2 on an insulating substrate is discovered. This technique will be of great use for both fundamental and applied studies of various electronic devices.
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