Unique Electronic Structure Induced High Photoreactivity of Sulfur-Doped Graphitic C3N4

Electronic structure intrinsically controls the light absorbance, redox potential, charge-carrier mobility, and consequently, photoreactivity of semiconductor photocatalysts. The conventional approach of modifying the electronic structure of a semiconductor photocatalyst for a wider absorption range by anion doping operates at the cost of reduced redox potentials and/or charge-carrier mobility, so that its photoreactivity is usually limited and some important reactions may not occur at all. Here, we report sulfur-doped graphitic C3N4 (C3N4−xSx) with a unique electronic structure that displays an increased valence bandwidth in combination with an elevated conduction band minimum and a slightly reduced absorbance. The C3N4−xSx shows a photoreactivity of H2 evolution 7.2 and 8.0 times higher than C3N4 under λ > 300 and 420 nm, respectively. More strikingly, the complete oxidation process of phenol under λ > 400 nm can occur for sulfur-doped C3N4, which is impossible for C3N4 even under λ > 300 nm. The homogeneous substitution of sulfur for lattice nitrogen and a concomitant quantum confinement effect are identified as the cause of this unique electronic structure and, consequently, the excellent photoreactivity of C3N4−xSx. The results acquired may shed light on general doping strategies for designing potentially efficient photocatalysts.