Healing of cutaneous wounds in a freshwater teleost, Labeo rohita: Scanning electron microscopical investigation

表皮(动物学) 解剖 伤口愈合 生物 野鲮属 电子显微镜 扫描电子显微镜 病理 医学 物理 光学 渔业 免疫学
作者
Amita Kumari,Nidhi Srivastava,Ashwini Kumar Nigam,Usha Kumari,Swati Mittal,Swati Mittal
出处
期刊:Microscopy Research and Technique [Wiley]
卷期号:75 (7): 890-897 被引量:17
标识
DOI:10.1002/jemt.22009
摘要

Abstract In this study, healing of cutaneous wounds in Labeo rohita using scanning electron microscope is reported. Wound area could be divided into three regions. Immediately after infliction of wound, edges retract exposing underlying tissues in wound gap (Region I). Simultaneously, at region close to wound edge (Region II), mucous goblet cell openings are observed with copious mucous secretions. Within 1 h, Region I gets covered by mucous secretions, and epidermis at edges starts migrating. Opposing fronts gradually advance and by 4–6 h come in contact to epithelialize wound gap. Zone of contact of fronts is demarcated by epidermal ridge, which is relatively prominent at 8 h. It gradually diminishes and is not distinguished at 24 h and afterward. At 1–4 h, microridges on epithelial cell surfaces appear irregularly arranged, widely spaced, short with abrupt ends at Region I; relatively extensive at Region II; and similar to those in controls at region surrounding Region II (Region III). At 12 h and afterward, microridges appear similar to those in controls at Regions I and II. At 1–2 h, isolated swollen epithelial cells, often in process of detachment and exfoliation at surface, are observed at Regions I and II. Such cells are infrequent at 8 h and afterward. Region I covered by migrated epidermis appears trough like at 4 h to 2 days, level of which gradually rises and at Day 4, surface of epidermis appears at a level similar to that at Regions II and III. Changes have been associated with the imbalance of osmotic homeostasis due to disruption of barrier between internal and external environment of skin. Microsc. Res. Tech. 2012. © 2012 Wiley Periodicals, Inc.
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