热离子发射
量子隧道
氧化物
载流子
电压降
材料科学
半导体
凝聚态物理
硅
活化能
钝化
电阻率和电导率
化学
光电子学
分析化学(期刊)
电流(流体)
图层(电子)
电子
纳米技术
热力学
电气工程
物理
工程类
冶金
有机化学
色谱法
量子力学
作者
Frank Feldmann,Gizem Nogay,Philipp Löper,David L. Young,Benjamin G. Lee,Paul Stradins,Martin Hermle,Stefan W. Glunz
标识
DOI:10.1016/j.solmat.2018.01.008
摘要
The charge carrier transport mechanism of passivating contacts which feature an ultra-thin oxide layer is investigated by studying temperature-dependent current-voltage characteristics. 4-Terminal dark J-V measurements at low temperatures reveal non-linear J-V characteristics of passivating contacts with a homogeneously grown silicon oxide, which result in an exponential increase in contact resistance towards lower temperature. The attempt to describe the R(T) characteristic solely by thermionic emission of charge carriers across an energy barrier leads to a significant underestimation of the resistance by several orders of magnitude. However, the data can be described properly with the metal-insulator-semiconductor (MIS) theory if tunneling of charge carriers through the silicon oxide layer is taken into account. Furthermore, temperature-dependent light J-V characteristics of solar cells featuring passivating contacts at the rear revealed a FF drop at T < 205 K, which is near the onset temperature of the exponential increase in contact resistivity.
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