材料科学
放大器
光电子学
宽禁带半导体
功率(物理)
外延
氮化镓
异质结
Ka波段
功率密度
电气工程
物理
纳米技术
工程类
CMOS芯片
量子力学
图层(电子)
作者
Ling Yang,Fuchun Jia,Hao Lu,Bin Hou,Meng Zhang,Jiale Du,Qingyuan Chang,Longge Deng,Qian Yu,Shiming Li,Mei Wu,Minhan Mi,Xiaohua Ma,Yue Hao
标识
DOI:10.1109/iedm45741.2023.10413780
摘要
In this work, we report the ultra-high RF power performance of GaN HEMTs at X- and Ka-band achieved by AlGaN/GaN/AlN:Fe heterostructure. Without field-plate design, a record output power density (P out ) of 33.1 W/mm and a peak power added efficiency (PAE) of 62.9% at X-band were achieved when tuned for maximum power and PAE, respectively. In addition, the laterally scaled-down device delivers a maximum P out up to 14.4 W/mm at Ka-band. These excellent load-pull results, spanning a broad frequency range, demonstrate the potential of the AlGaN/GaN/AlN:Fe epitaxial structure as an attractive material platform for advancing GaN/SiC HEMTs in RF power amplifier applications.
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