MOSFET
材料科学
工作职能
阈值电压
灵敏度(控制系统)
光电子学
堆栈(抽象数据类型)
电极
电压
氧化物
栅氧化层
金属
物理
晶体管
电子工程
工程类
冶金
量子力学
计算机科学
程序设计语言
作者
Suchismita Tewari,Avik Chattopadhyay
标识
DOI:10.1080/03772063.2022.2130451
摘要
In this paper, for the first time, a dual-metal double-gate with oxide stack (low-k/high-k) junctionless MOSFET (DM-DG-OS JL-MOSFET) based sensor device has been explored for finding its suitability in detecting charged nanometric biospecies under dry environment condition. The analysis of sensing performance of the device for such detection is made in terms of the absolute and the relative changes in threshold voltage (Vth). The influence of work-function difference of dual metal gate electrodes, along with the position of nanogap cavity, on the sensing metrics has been thoroughly investigated. The impact of the cavity dimensions on sensitivity parameters of the projected device is also studied. An optimum cavity dimension, for channel length (Lch) of 1 µm, is found to be 400 nm × 10 nm in yielding measurable sensitivity parameters for charged nanometric biospecies detection. A device with 1-µm Lch exhibits superior sensitivity performance in terms of percentage improvements in the absolute and the relative changes in Vth for a higher drain-side gate-metal work-function (ϕM2) relative to source-side gate-metal work-function (ϕM1) for source-side cavity (400 nm × 10 nm) compared to the case when ϕM1>ϕM2 and the cavity is located near drain-side. Respective performance enhancements are found to be 30.7% and 74% for detection of negatively charged nanometric biospecies. The sensor devices with Lch of 50 nm show the similar trend.
科研通智能强力驱动
Strongly Powered by AbleSci AI